Effects of Pressurization Conditions on the Pattern Transfer in the Thermal Nanoimprint Lithography

열 나노임프린트 공정에서 가압조건이 패턴전사에 미치는 영향

  • Lee, Woo Young (School of Mechanical Engineering, Korea University of Technology and Education) ;
  • Lee, Ki Yeon (Department of Mechanical Engineering, Soonchunhyang University) ;
  • Kim, Kug Weon (Department of Mechanical Engineering, Soonchunhyang University)
  • 이우영 (한국기술교육대학교 기계공학부) ;
  • 이기연 (순천향대학교 공과대학 기계공학과) ;
  • 김국원 (순천향대학교 공과대학 기계공학과)
  • Received : 2013.11.05
  • Accepted : 2013.11.30
  • Published : 2013.12.31

Abstract

Nanoimprint lithography (NIL) is the next generation photolithography process in which the photoresist is dispensed onto the substrate in its liquid form and then imprinted and cured into a desired pattern instead of using traditional optical system. There have been considerable attentions on NIL due to its potential abilities that enable cost-effective and high-throughput nanofabrication to the display device and semiconductor industry. In this paper, a pressure vessel type imprinting system was used to imprint patterns with two type pressure values (25 bar, 30 bar) and two type pressure keeping times (5 min, 10 min). The height of transferred pattern and the thickness of residual layer were measured and effects of pressurization conditions - pressure and pressure keeping time - on the pattern transfer in thermal NIL were investigated.

Keywords

Acknowledgement

Supported by : 한국연구재단

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