• Title/Summary/Keyword: Deposition rate

Search Result 682, Processing Time 0.204 seconds

Influence of Deposition Rate on the Optoelectrical Properties of TIO Thin Films (증착율 변화에 따른 TIO 박막의 전기적, 광학적 특성 변화)

  • Moon, Hyun-Joo;Kim, Daeil
    • Journal of the Korean Society for Heat Treatment
    • /
    • v.29 no.2
    • /
    • pp.62-65
    • /
    • 2016
  • TIO thin films were deposited on the poly-carbonate substrates with RF magnetron sputtering under different sputtering power condition to investigate the influence of deposition rate on the electrical and optical properties of the films. Although, all films have the similar carrier concentration, the films prepared at a lower deposition rate of 4 nm/min show a higher mobility of $5.96cm^2\;V^{-1}S^{-1}$ due to the low surface roughness. In addition, optical transmittance is also influenced by a deposition rate. Based on the figure of merit, it can be concluded that the lower deposition rate effectively enhances the opto-electrical performance of IGZO films for use as transparent conducting oxides in flexible display applications.

Effect of Additives on Deposition Rate and Stability of Electroless Black Ni-Zn-P Plating (무전해 Ni-Zn-P 도금의 속도 및 안정성에 미치는 첨가제의 영향)

  • 오영주;황경진;정원용;이만승
    • Journal of the Korean institute of surface engineering
    • /
    • v.36 no.4
    • /
    • pp.317-323
    • /
    • 2003
  • The effect of additives such as complexing agents, stabilzers and boric acid on the bath stability and the deposition rate of electroless black Ni-Zn plating has been examined. The deposits obtained became black and showed an amorphous structure. The significant increasing in the deposition rate was not found when only glycine and citric acid were used as complexing agents. The deposition rate increased up to 3 and 4 times by adding malic acid and glycolic acid as an additional complexing agent, respectively. The stabilizers and the boric acid, however, had little influence on the deposition rate.

The Optimization of the Selective CVD Tungsten Process using Statistical Methodology (통계적 기법을 이용한 선택적 CVD 텅스텐 공정 최적화 연구)

  • 황성보;최경근;박흥락;고철기
    • Journal of the Korean Institute of Telematics and Electronics A
    • /
    • v.30A no.12
    • /
    • pp.69-76
    • /
    • 1993
  • The statistical methodology using RSM (response surface method) was used too ptimize the deposition conditions of selective CVD tungsten process for improving the deposition rate and the adhesion property. Temperature, flow rate of SiH$_4$ and WF$_6$ and H$_2$ and Ar carrier gases were chosen for the deposition variables and process characteristics due to carrier gas were intensively investigated. It was observed that temperature was the main factor influencingthe deposition rate in the case of H$_2$ carrier gas while the reactant ratio, $SiH_{4}/WF_{6}$, had the principal effect on the deposition rate in the case of Ar carrier gas. The increased deposition rate and the good adhesion to Si were obtained under Ar carrier gas compared to H$_2$ carrier gas. The optimum conditions for deposition rate and antipeeling property were found to be the temperature range of 300~32$0^{\circ}C$ and the reactant ratio, $SiH_{4}/WF_{6}$, of 0.5~0.6.

  • PDF

Luminous Properties in Organic Light-Emitting Diodes Depending on the deposition rate of $Alq_3$ ($Alq_3$의 증착속도에 따른 유기발광소자의 발광특성)

  • Kim, Weon-Jong;Lee, Young-Hwan;Yang, Jae-Hoon;Shim, Nak-Soon;Kim, Tae-Wan;Hong, Jin-Woong
    • Proceedings of the KIEE Conference
    • /
    • /
    • pp.154-156
    • /
    • 2005
  • In the device structure of ITO/tris (8-hydroxyquinoline) aluminum(Alq3)/Al, we investigated the Organic Light-Emitting Diodes (OLEDs) properties as a function of the deposition rate of the $Alq_3$. The deposition rate was from 0.5 to 2.0 $[{\AA}/s]$ in a base pressure of $5{\times}10^{-6}$ [Torr]. It was found that a $Alq_3$ deposition rate of around 1.5 $[{\AA}/s]$ is the optimum for the maximum luminous properties. The optimum deposition rate of $Alq_3$ is 1.5 $[{\AA}/s]$.

  • PDF

A Research on Analytic method of determining Penetration Factor and Deposition Rate for Predicting Indoor Particle Concentration (실내 미세먼지 농도 예측을 위한 침입계수 및 침착률 산정방법에 관한 연구)

  • Yee, Su-Whan;Lee, Byung-Hee;Back, Ji-Min;Kang, Dong-Hwa;Yeo, Myoung-Souk;Kim, Kwang-Woo
    • Journal of the Architectural Institute of Korea Structure & Construction
    • /
    • v.33 no.11
    • /
    • pp.35-42
    • /
    • 2017
  • Airtightness of modern buildings has been increased and people are staying indoors about 20 hours a day. As indoor residence time increase, effect of indoor air quality on health got higher. Deposition rate and penetration factor are important factors for predicting indoor particle concentration. However, these values can be determined differently during analyzing process. In this paper uncertainty of determining deposition rate and penetration factor that comes from entering different input data is experimentally examined. As a result, deposition rate got higher as particle size increase and penetration factor got lower as particle size increase, but these value could be changed as input data changes even if experiment was passed off in same place. For calculating correct deposition rate and penetration factor, standard for setting input data has to be established and experiment has to be repeated many times.

Electrical Properties of OLEDs due to the Hole-size of Crucible Boat and Deposition Rate of Hole Transport Layer (Crucible Boat 홀 크기와 정공 수송층 증착속도에 따른 유기밭광 다이오드의 전기적 특성)

  • Kim, Weon-Jong;Shin, Hyun-Teak;Shin, Jong-Yeol;Hong, Jin-Woong
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
    • /
    • v.22 no.1
    • /
    • pp.74-80
    • /
    • 2009
  • In the structure of ITO/N,N'-diphenyl-N,N' bis (3-methylphenyl)-1,1'-biphenyl-4,4'-diamine(TPD)/tris (8-hydroxyquinoline)aluminum($Alq_3$)/Al device, we studied the efficiency improvement of organic light-emitting diodes due to variation of deposition rate of hole transport layer (TPD) materials using hole-size of crucible boat. The thickness of TPD and $Alq_3$ was manufactured 40 nm, 60 nm, respectively under a base pressure of $5{\times}10^{-6}$ Torr using a thermal evaporation. The $Alq_3$ used for an electron-transport and emissive layer were evaporated to be at a deposition rate of $2.5\;{\AA}/s$. When the deposition rate of TPD increased from 1.5 to $3.0\;{\AA}/s$, we studied the efficiency improvement of TPD using the hole-size of crucible is 1.0 mm. When the deposition rate of TPD is $2.5\;{\AA}/s$, we found that the average roughness is rather smoother, the luminous efficiency the external quantum efficiency is superior to the others. Compared to the two from the devices made with the deposition rate of TPD is $2.0\;{\AA}/s$ and $3.0\;{\AA}/s$, the external quantum efficiency was improved by four-times and two-times, respectively.

Electrical Characteristics of OLEDs depending on the Deposition Rate of Hole Transport Layer(TPD) (정공 수송층(TPD) 증착 속도에 따른 유기 발광 소자의 전기적 특성)

  • Kim, Weon-Jong;Lee, Young-Hwan;Lee, Sang-Kyo;Park, Hee-Doo;Cho, Kyung-Soon;Kim, Tae-Wan;Hong, Jin-Woong
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
    • /
    • /
    • pp.87-88
    • /
    • 2008
  • In the structure of ITO/N,N'-diphenyl-N,N' bis (3-methylphenyl)-1,1'-biphenyl-4,4'-diamine(TPD)/tris (8-hydroxyquinoline)aluminum$(Alq_3)$/Al device, we studied the efficiency improvement of organic light-emitting diodes due to variation of deposition rate of TPD materials. The thickness of TPD and $Alq_3$ was manufactured 40 nm, 60 nm, respectively under a base pressure of $5\times10^{-6}$Torr using a thermal evaporation. The $Alq_3$ used for an electron-transport and emissive layer were evaporated to be at a deposition rate of 2.5 $\AA$/s. When the deposition rate of TPD increased from 1.5 to 3.0 $\AA$/s, we found that the average roughness is rather smoother, external quantum efficiency is superior to the others when the deposition rate of TPD is 2.5 $\AA$/s. Compared to the ones from the devices made with the deposition rate of TPD 3.0 $\AA$/s, the external quantum efficiency was improved by a factor of eight.

  • PDF

An experiment of the particle deposition on a circular cylinder in a laminar flow (원관 주위 유하 액막에 의한 관 외벽에서의 입자 부착에 대한 실험)

  • 정종수;이윤표;정기만;박찬우
    • Korean Journal of Air-Conditioning and Refrigeration Engineering
    • /
    • v.12 no.2
    • /
    • pp.113-119
    • /
    • 2000
  • An experimental study has been carried out in order to investigate on a particle deposition on a circular cylinder surface. The present study is focused on the particulate fouling occurring in a heat exchanger for a seawater desalinization, in a laminar flow over circular cylindrical tubes. The objective is to investigate how NaCl concentration influences the $SiO2$ particle deposition on the surface of a glass circular cylinder. The NaCl concentration was changed from 0 g/L to 40 g/L. As the experimental results of $SiO2$ particle which is deposited on the glass circular cylinder surface showed, particle deposition rate per unit time increases rapidly with the increase of NaCl concentration between 0 g/L and 15 g/L. After the maximum of particle deposition rate was found at the NaCl concentration of 15 g/L, particle deposition rate remains unchanged or decreases gradually with the NaCl concentration from 15 g/L to 40 g/L. Also the $SiO2$ deposition rate of particles does not have serious variations with the position at present glass surface.

  • PDF

Simulation and Characteristic Measurement with Sputtering Conditions of Triode Magnetron Sputter

  • Kim, Hyun-Hoo;Lim, Kee-Joe
    • Transactions on Electrical and Electronic Materials
    • /
    • v.5 no.1
    • /
    • pp.11-14
    • /
    • 2004
  • An rf triode magnetron sputtering system is designed and installed its construction in vacuum chamber. In order to calibrate the rf triode magnetron sputtering for thin films deposition processes, the effects of different glow discharge conditions were investigated in terms of the deposition rate measurements. The basic parameters for calibrating experiment in this sputtering system are rf power input, gas pressure, plasma current, and target-to-substrate distance. Because a knowledge of the deposition rate is necessary to control film thickness and to evaluate optimal conditions which are an important consideration in preparing better thin films, the deposition rates of copper as a testing material under the various sputtering conditions are investigated. Furthermore, a triode sputtering system designed in our team is simulated by the SIMION program. As a result, it is sure that the simulation of electron trajectories in the sputtering system is confined directly above the target surface by the force of E${\times}$B field. Finally, some teats with the above 4 different sputtering conditions demonstrate that the deposition rate of rf triode magnetron sputtering is relatively higher than that of the conventional sputtering system. This means that the higher deposition rate is probably caused by a high ion density in the triode and magnetron system. The erosion area of target surface bombarded by Ar ion is sputtered widely on the whole target except on both magnet sides. Therefore, the designed rf triode magnetron sputtering is a powerful deposition system.

The Effects of Deposition Rate on the Physical Characteristics of OLEDs (유기발광 다이오드의 물성에 미치는 증착속도의 영향)

  • Lee, Young-Hwan;Cha, Ki-Ho;Kim, Weon-Jong;Lee, Jong-Yong;Kim, Gwi-Yeol;Hong, Jin-Woong
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
    • /
    • /
    • pp.54-55
    • /
    • 2006
  • Organic light-emitting diodes(OLEOs) are attractive because of possible application in display with low operating voltage, low power consumption, self-emission and capability of multicolor emission by the selection of emissive material. We investigated the effects of deposition rate on the electrical characteristics, physical characteristics and optical characteristics of OLEOs in the ITO(indium-tin-oxide)/N.N'-diphenyl-N,N'-bis(3-methyphenyl)-1,1'-biphenyl-4,4'-diamine(TPD)/tris(8-hydroxyquinoline)aluminum($Alq_3$)/Al device. We measured current density, luminous flux and luminance characteristics of devices with varying deposition rates of TPD and $Alq_3$. It has been found that optimal deposition rate of TPD and $Alq_3$ were respectively $1.5{\AA}/s$ from the device structure. An AFM measurement results, surface roughness of the deposited film was the lowest when deposition rate was $1.5{\AA}/s$.

  • PDF