Deposition conditions of $YBa_{2}$$Cu_{3}$$O_{7-x}$ deposited by a MOCVD method for coated conductors

MOCVD 법에 의해 증착 된 coated conductor용 $YBa_{2}$$Cu_{3}$$O_{7-x}$의 증착조건

YBa$_2$Cu$_3$$O_{7-x}$ thin films for coated conductor application were deposited on a MgO single crystalline substrate by a metal organic chemical vapor deposition (MOCVD) system of a vertical type using a single liquid source. The film uniformity was enhanced by controlling the gas shower head structure, the distance between the shower head and substrate, and the rotation of the substrate. The source mole ratio of Y(thd)$_3$: Ba(thd)$_2$: Cu(thd)$_2$ was changed for obtaining stoichiometric film. The phase formation, crystal orientation, surface morphology and film composition were investigated with different source mole ratios, and the critical temperature (T$_{c}$) was measured.red.