Filtered Plasma Deposition and MEVVA Ion Implantation

  • Liu, A.D. (The Institute of Low Energy Nuclear Physics, Beijing Radiation Center, Beijing Normal University) ;
  • Zhang, H.X. (The Institute of Low Energy Nuclear Physics, Beijing Radiation Center, Beijing Normal University) ;
  • Zhang, T.H.
  • Published : 2003.10.01

Abstract

The modification of metal surface by ion implantation with MEVVA ion implanter and thin film deposition with filtered vacuum arc plasma device is introduced in this paper. The combination of ion implantation and thin film deposition is proved as a better method to improve properties of metal surface.

Keywords

References

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