극히 얕은 $N^+$-P 실리콘 접합에서의 어발런치 현상

Avalanche Phenomenon at The Ultra Shallow $N^+$-P Silicon Junctions

  • 이정용 (청주대학교 이공대학 전자정보공학부)
  • Lee, Jung-Yong (Div. of Electronics & Information Engineering, Cheongju University)
  • 발행 : 2007.09.30

초록

Ultra thin Si p-n junctions shallower than $300{\AA}$ were fabricated and biased to the avalanche regime. The ultra thin junctions were fabricated to be parallel to the surface and exposed to the surface without $SiO_2$ layer. Those junctions emitted white light and electrons when junctions were biased in the avalanche breakdown regime. Therefore, we could observe the avalanche breakdown region visually. We could also observe the influence of electric field to the current flow visually by observing the white light which correspond to the avalanche breakdown region. Arrayed diodes emit light and electrons uniformly at the diode area. But, the reverse leakage current were larger than those of ordinary diodes, and the breakdown voltage were less than 10V.

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