반도체디스플레이기술학회지 (Journal of the Semiconductor & Display Technology)
- 제7권4호
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- Pages.29-33
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- 2008
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- 1738-2270(pISSN)
극저온 $CO_2$ 세정과정 시 미세오염물의 탈착 메커니즘 연구
A dynamic analysis on minute particles' detachment mechanism in a cryogenic $CO_2$ cleaning process
- Seok, Jong-Won (Sch. of Mech. Eng at Chung-Ang Univ.) ;
- Lee, Seong-Hoon (Grad. Sch. of Mech. Eng at Chung-Ang Univ.) ;
- Kim, Pil-Kee (Grad. Sch. of Mech. Eng at Chung-Ang Univ.) ;
- Lee, Ju-Hong (Grad. Sch. of Mech. Eng at Chung-Ang Univ.)
- 발행 : 2008.12.30
초록
Rapid increase of integrity for recent semiconductor industry highly demands the development of removal technology of contaminated particles in the scale of a few microns or even smaller. It is known that the surface cleaning technology using
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