반도체디스플레이기술학회지 (Journal of the Semiconductor & Display Technology)
- 제7권2호
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- Pages.1-5
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- 2008
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- 1738-2270(pISSN)
실리사이드 형성 과정에 대한 재 조명
Reinvestigation on the silicide formation process
- 남형진 (선문대학교 전자공학부)
- Nam, Hyoung-Gin (Division of Electronic Engineering, Sun Moon University)
- 발행 : 2008.06.30
초록
Silicide formation process and the formation sequence were investigated in this study. It was postulated that the formation of the second silicide phase involves glass formation between the first silicide phase and Si given that a thin metal film is deposited on a Si substrate. The concentration of glass was assumed to be located where the free energy of the liquid alloy with respect to the first nucleated compound and solid Si (