Journal of the Semiconductor & Display Technology (반도체디스플레이기술학회지)

The Korean Society Of Semiconductor & Display Technology (한국반도체디스플레이기술학회)
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Application of Reverse Engineering System for Improvement of Curl Distortion in Stereolithography Process

광조형 공정시 휨에 의한 변형을 개선하기 위한 역설계 시스템의 적용

  • Che, Woo-Seong (Dept. of Mechatronics Engineering Kyung sung university)
  • 제우성 (경성대학교 공과대학 메카트로닉스 공학과)
  • Published : 2009.12.31
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Abstract

The slender device(long length and thin width) manufactured by stereolithography process suffers from large curl distortion. This paper adapts two control parameters such as a critical exposure and a penetration depth. The measurement of the test parts dimension are carried out by reverse engineering method with the optical 3-dimensional measurement equipment. We investigate how each parameter contributes to the part accuracy and estimates the optimal set of parameters which minimizes the dimensional error of the test parts. Finally, As being an the RAM slot as being an example of the slender device, the RAM slot is made with the optimal values of control parameter and the results are investigated

Keywords

References

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