Journal of the Semiconductor & Display Technology (반도체디스플레이기술학회지)

The Korean Society Of Semiconductor & Display Technology (한국반도체디스플레이기술학회)
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CFD Analysis on the Internal Air Flow Control in a Wax Spin Coater of Silicon Wafer Polishing Station

실리콘 웨이퍼 연마장비용 왁스 스핀코팅장치의 내부기류 제어에 관한 전산유동해석

  • Kim, Kyoung-Jin (Department of Mechanical System Engineering, Kumoh National Institute of Technology) ;
  • Kim, Dong-Joo (Department of Mechanical Engineering, Kumoh National Institute of Technology) ;
  • Park, Joong-Youn (Department of Mechatronics, Kumoh National Institute of Technology)
  • 김경진 (금오공과대학교 기계시스템공학과) ;
  • 김동주 (금오공과대학교 기계공학과) ;
  • 박중윤 (금오공과대학교 기전공학과)
  • Received : 2011.01.03
  • Accepted : 2011.02.28
  • Published : 2011.03.31
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Abstract

In this paper, the air flow induced by the rotating flat disk is numerically investigated in a hope to better understand the air flow structures inside the wax spin coater for a silicon wafer polishing station. Due to the complex inner geometry of actual spin coater such as the casing around the rotating ceramic block and servo motor, recirculation of air flow is inevitably found on the coating target if the internal space of spin coater is closed at the bottom and it could be the possible source of contamination on the wax coating. By numerical flow simulation, we found that it is necessary to install the air vent at the bottom and to apply the sufficient air suction in order to control the path of air flow and to eliminate the air recirculation zone above the spinning surface of coating target.

Keywords

References

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