Journal of the Korean Vacuum Society (한국진공학회지)

The Korean Vacuum Society (한국진공학회)
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Structural and Magnetic Properties of Fe-Diluted Si Alloy Films by Pulsed-Laser Deposition

펄스레이저 증착법에 의한 Fe 희석된 Si 합금의 구조 및 자기 물성 연구

  • Received : 2012.07.10
  • Accepted : 2012.09.24
  • Published : 2012.09.30
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Abstract

Fe-diluted Si alloys grown on p-type Si (100) substrates by pulsed-laser deposition method were studied for structural, electrical, and magnetic properties. The X-ray diffraction patterns for these alloy samples showed a few of peaks with cubic structures such as FeSi, $Fe_3Si$, and $Fe_4Si$. The Fe-composition in alloys are confirmed as Fe atomic percent about 1.25~6.49 % from energy dispersive spectroscopy measurement. The resistivity as a function of the reciprocal temperature was indicated an exponential increase with two activation energies of 5.21 and 7.79 meV. The maximum value of the magnetization at 10 K was about 100 emu/cc, and the ferromagnetism was also observed until 350 K from total magnetization as a function of temperature with applied magnetic field of 3,000 Oe.

펄스레이저 증착법으로 P형 실리콘(100) 기판위에 증착한 Fe 희석된 Si 합금의 구조와 전기적 및 자기적 물성을 연구하였다. 합금시료에 대한 X-선 회절패턴에서 육방정계에 해당하는 FeSi, $Fe_3Si$, 및 $Fe_5Si_3$와 관련된 여러 개의 회절신호가 관측되었으며, 에너지분산분광 측정에 의한 시료내 Fe 원자의 함량은 1.25~6.49 atm, %로 나타났다. 또한, 온도변화에 따른 전기비저항 값의 측정으로부터 5.21 meV와 7.79 meV 두 개의 활성화에너지를 얻을 수 있었다. 절대온도 10 K에서 측정한 최대 자화는 약 100 emu/cc로 나타났으며, 3,000 Oe의 외부자기장하에서 온도의 함수로 측정한 자화 값으로부터 시료의 강자성 특성은 350 K까지도 유지됨을 알 수 있었다.

Keywords

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