Journal of the Semiconductor & Display Technology (반도체디스플레이기술학회지)

The Korean Society Of Semiconductor & Display Technology (한국반도체디스플레이기술학회)
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Silicon Solar Cell Efficiency Improvement with surface Damage Removal Etching and Anti-reflection Coating Process

표면결함식각 및 반사방지막 열처리에 따른 태양전지의 효율 개선

  • Cho, Chan Seob (Shool of Electrical Engineering, Kyungpook National University) ;
  • Oh, Jeong Hwa (Samsung Electronics) ;
  • Lee, Byeungleul (School of Mechatronics Engineering, Korea University of Technology and Education) ;
  • Kim, Bong Hwan (Department of Electronics Engineering, Catholic University of Daegu)
  • 조찬섭 (경북대학교 산업전자공학부) ;
  • 오정화 (삼성전자) ;
  • 이병렬 (한국기술교육대학교 메카트로닉스공학부) ;
  • 김봉환 (대구가톨릭대학교 전자공학과)
  • Received : 2014.05.28
  • Accepted : 2014.06.20
  • Published : 2014.06.30
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Abstract

In this study general solar cell production process was complemented, with research on improvement of solar cell efficiency through surface structure and thermal annealing process. Firstly, to form the pyramid structure, the saw damage removal (SDR) processed surface was undergone texturing process with reactive ion etching (RIE). Then, for the formation of smooth pyramid structure to facilitate uniform doping and electrode formation, the surface was etched with HND(HF : HNO3 : D.I. water=5 : 100 : 100) solution. Notably, due to uniform doping the leakage current decreased greatly. Also, for the enhancement and maintenance of minority carrier lifetime, antireflection coating thermal annealing was done. To maintain this increased lifetime, front electrode was formed through Au plating process without high temperature firing process. Through these changes in two processes, the leakage current effect could be decreased and furthermore, the conversion efficiency could be increased. Therefore, compared to the general solar cell with a conversion efficiency of 15.89%, production of high efficiency solar cell with a conversion efficiency of 17.24% was made possible.

Keywords

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