DOI QR코드

DOI QR Code

Growth of Textured CoFe2O4 Thin Films on Platinized Silicon Prepared by a Sol-Gel Method

  • Mustaqima, Millaty (Department of Physics, Hankuk University of Foreign Studies) ;
  • Lee, Min Young (Department of Physics, Hankuk University of Foreign Studies) ;
  • Kim, Deok Hyeon (Department of Physics, Hankuk University of Foreign Studies) ;
  • Lee, Bo Wha (Department of Physics, Hankuk University of Foreign Studies) ;
  • Liu, Chunli (Department of Physics, Hankuk University of Foreign Studies)
  • Received : 2014.05.26
  • Accepted : 2014.08.14
  • Published : 2014.09.30

Abstract

We fabricated textured polycrystalline $CoFe_2O_4$ thin films on $Pt(111)/TiO_2/SiO_2/Si$ substrate through a sol-gel method. We varied the thickness of the films, by using precursor solutions with different concentrations of 0.1, 0.2, and 0.3 M, and by depositing 5, 8, or 10 layers on the substrate by spin-coating. X-ray diffraction spectra indicated that when the precursor concentration of the solution was higher than 0.1 M, the spin-coated films were preferentially oriented in the <111> direction. Inspection of the surface morphology by scanning electron microscopy revealed that $CoFe_2O_4$ thin films prepared with 0.2 M solution and 5-time spin-coatings had smoother surface, as compared to the other conditions. Each coating had an average thickness of about 50 nm. The magnetic properties measured by vibrating sample magnetometer showed magnetic anisotropy, as evidenced from the difference in the in-plane and out-of-plane hysteresis loops, which we attributed to the textured orientation of the $CoFe_2O_4$ thin films.

Keywords

References

  1. N. C. Pramanik, T. Fujii, M. Nakanishi, and J. Takada, J. Mater. Sci. 40, 4169 (2005). https://doi.org/10.1007/s10853-005-3819-1
  2. J. G. Lee, J. Y. Park, Y-J. Oh, and C. S. Kim, J. Appl. Phys. 84, 2801 (1998). https://doi.org/10.1063/1.368393
  3. J. D. dos S. Duque, M. A. Macedo, N. O. Moreno, J. L. Lopez, and H.-D. Pfanes, J. Magn. Magn. Mater. 226, 1424 (2001).
  4. B. Zhou, Y.-W. Zhang, C.-S. Liao, and C.-H. Yan, J. Magn. Magn. Mater. 247, 70 (2002). https://doi.org/10.1016/S0304-8853(02)00150-6
  5. D. H. Kim, D. E. Nikles, C. S. Brazel, J. Magn. Magn. Mater. 320, 2390 (2008). https://doi.org/10.1016/j.jmmm.2008.05.023
  6. H. M. Joshi, Y. P. Lin, M. Aslam, P. V. Prasad, E.A. Schultz-Sikma, R. Edelman, T. Meade, and V. P. J. Dravid, J. Phys. Chem. C 113, 17761 (2009). https://doi.org/10.1021/jp905776g
  7. H. M. Fan, J. B. Yi, Y. Yang, K. W. Kho, H. R. Tan, Z. X. Shen, J. Ding, X. W. Sun, M. C. Olivo, and Y. P. Feng, ACS Nano 3, 2789 (2009). https://doi.org/10.1021/nn900671u
  8. Gang Jian, Qiuyun Fu, and Dongxiang Zhou, J. Magn. Magn. Mater. 324, 671 (2012). https://doi.org/10.1016/j.jmmm.2011.08.036
  9. M. Y. Rafique, L. Pan, Q. Javed, M. Z. Iqbal, and L. Yang, J. Nanopart. Res. 14, 1189 (2012). https://doi.org/10.1007/s11051-012-1189-6
  10. H. Cui, Y. Jia, W. Ren, and W. Wang, J. Sol-Gel Sci. Technol. 55, 36 (2010). https://doi.org/10.1007/s10971-010-2210-0
  11. A. V. Ramos, T.S. Santos, G. X. Miao, M.-J. Guittet, J.-B. Moussy, and J. S. Moodera, Phys. Rev. B 78, 180402 (2008). https://doi.org/10.1103/PhysRevB.78.180402
  12. Y.-Q. Chu, Z.-W. Fu, and Q.-Z. Qin, Electrochimica Acta 49, 4915 (2004). https://doi.org/10.1016/j.electacta.2004.06.012
  13. A. K. Giri, E. M. Kirkpatrick, P. Moongkhamklang, S. A. Majetich, and V. G. Harris, Appl. Phys. Lett. 80, 2341 (2002). https://doi.org/10.1063/1.1464661
  14. J. Ma, J. Hu, Z. Li, and C.-W. Nan, Adv. Mater. 23, 1062 (2011). https://doi.org/10.1002/adma.201003636
  15. J. H. Lee, and B. O. Park, Thin Solid Films 426, 94 (2003). https://doi.org/10.1016/S0040-6090(03)00014-2
  16. X. W. Wang, Y. Q. Zhang, H. Meng, Z. J. Wang, and Z. D. Zhang, J. Alloys Compd. 509, 7803 (2011). https://doi.org/10.1016/j.jallcom.2011.05.021
  17. F. Cheng, Z. Peng, Z. Xu, C. Liao, and C. Yan, Thin Solid Films 339, 109 (1999). https://doi.org/10.1016/S0040-6090(98)01159-6
  18. A.-K. Axelsson, F. Aguesse, L. Spillane, M. Valant, D. W. McComb, and N. M. Alford, Acta Mater. 59, 514 (2011). https://doi.org/10.1016/j.actamat.2010.09.052
  19. P. C. Dorsey, P. Lubitz, D. B. Chrisey, and J. S. Horwitz, J. Appl. Phys. 79, 6338 (1996). https://doi.org/10.1063/1.361991
  20. M. Khodaei, S. A. S. Ebrahimi, Y. J. Park, J. M. Ok, J. S. Kim, J. Son, and S. Baik, J. Magn. Magn. Mater. 340, 16 (2013). https://doi.org/10.1016/j.jmmm.2013.03.019
  21. L. Horng, G. Chern, M. C. Chen, P. C. Kang, and D. S. Lee, J. Magn. Magn. Mater. 270, 389 (2004). https://doi.org/10.1016/j.jmmm.2003.09.005
  22. Z. Yang, C. Ke, L. L. Sun, W. Zhu, H. B. Lu, and L. Wang, Thin Solid Films 519, 2067 (2011). https://doi.org/10.1016/j.tsf.2010.10.035
  23. Y. C. Wang, J. Ding, J. B. Yi, B. H. Liu, T. Yu, and Z. X. Shen, Appl. Phys. Lett. 84, 2596 (2004). https://doi.org/10.1063/1.1695438
  24. S. Seifikar, A. Tabei, E. Sachet, T. Rawdanowicz, N. BGharb, and J. Schwartz, J. Appl. Phys. 112, 063908 (2012). https://doi.org/10.1063/1.4752725
  25. W. Hu, X. Chen, G. Wu, Y. Lin, N. Qin, and D. Bao, Appl. Phys. Lett. 101, 063501 (2012). https://doi.org/10.1063/1.4744950
  26. W. Hu, N. Qin, G. Wu, Y. Lin, S. Li, and D. Bao, J. Am. Chem. Soc. 134, 14658 (2012). https://doi.org/10.1021/ja305681n
  27. B. S. Yoo, Y. G. Chae, Y. M. Kwon, D. H. Kim, B. W. Lee, and Chunli Liu, J. Magn. 18, 230 (2013). https://doi.org/10.4283/JMAG.2013.18.3.230
  28. B. D. Cullity, Introduction to Magnetic Materials, Addison-Wesley, London (1972) p. 210.
  29. J. H. Yin, J. Ding, B. H. Liu, J. B. Yi, X. S. Miao, and J. S. Chen, J. Appl. Phys. 101, 09K509 (2007). https://doi.org/10.1063/1.2709763

Cited by

  1. Regulation of the forming process and the set voltage distribution of unipolar resistance switching in spin-coated CoFe2O4 thin films vol.10, pp.1, 2015, https://doi.org/10.1186/s11671-015-0876-5
  2. thin films deposited by the solution processing vol.109, pp.15, 2016, https://doi.org/10.1063/1.4964836
  3. layers vol.121, pp.24, 2017, https://doi.org/10.1063/1.4990281