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Design of High-Speed EEPROM IP Based on a BCD Process

BCD 공정기반의 고속 EEPROM IP 설계

  • Jin, RiJun (Department of Electronic Engineering, Changwon National University) ;
  • Park, Heon (Department of Electronic Engineering, Changwon National University) ;
  • Ha, Pan-Bong (Department of Electronic Engineering, Changwon National University) ;
  • Kim, Young-Hee (Department of Electronic Engineering, Changwon National University)
  • Received : 2017.10.13
  • Accepted : 2017.10.25
  • Published : 2017.10.30

Abstract

In this paper, a local DL (Data Line) sensing method with smaller parasitic capacitance replacing the previous distributed DB sensing method with large parasitic capacitance is proposed to reduce the time to transfer BL (Bit Line) voltage to DL in the read mode. A new BL switching circuit turning on NMOS switches faster is also proposed. Furthermore, the access time is reduced to 35.63ns from 40ns in the read mode and thus meets the requirement since BL node voltage is clamped at 0.6V by a DL clamping circuit instead of precharging the node to VDD-VT and a differential amplifier are used. The layout size of the designed 512Kb EEPROM memory IP based on a $0.13{\mu}m$ BCD is $923.4{\mu}m{\times}1150.96{\mu}m$ ($=1.063mm^2$).

본 논문에서는 읽기 모드에서 BL (Bit Line)의 전압을 DL (Data Line)에 전달하는 시간을 줄이기 위해 기생하는 커패시턴스가 큰 distributed DB 센싱 방식 대신 기생하는 커패시턴스가 작은 local DL 센싱 방식을 제안하였다. 그리고 읽기 모드에서 NMOS 스위치를 빠르게 ON 시키는 BL 스위치 회로를 제안하였다. 또한 BL 노드 전압을 VDD-VT로 선 충전하는 대신 DL 클램핑 회로를 사용하여 0.6V로 클램핑 하고 차동증폭기를 사용하므로 읽기 모드에서 access 시간을 35.63ns로 40ns를 만족시켰다. $0.13{\mu}m$ BCD 공정을 기반으로 설계된 512Kb EEPROM IP의 레이아웃 면적은 $923.4{\mu}m{\times}1150.96{\mu}m$($=1.063mm^2$)이다.

Keywords

References

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