반도체디스플레이기술학회지 (Journal of the Semiconductor & Display Technology)

한국반도체디스플레이기술학회 (The Korean Society Of Semiconductor & Display Technology)
권호 표지

고성능 TFT 소자 응용을 위한 폴리스티렌 나노입자를 이용한 나노 그물망 제작공정 개발

Formation of nanonet structure using polystyrene nanoparticle for high-performances TFT applications

  • 윤길상 (포항공과대학교 전자전기공학과) ;
  • 이준영 (포항공과대학교 전자전기공학과) ;
  • 박익수 (포항공과대학교 전자전기공학과) ;
  • ;
  • 백록현 (포항공과대학교 전자전기공학과) ;
  • 신현진 (충남대학교 수의학과) ;
  • 이정수 (포항공과대학교 전자전기공학과)
  • Yoon, Gilsang (Department of Electrical Engineering, POSTECH) ;
  • Lee, Junyoung (Department of Electrical Engineering, POSTECH) ;
  • Park, Iksoo (Department of Electrical Engineering, POSTECH) ;
  • Jin, Bo (Department of Electrical Engineering, POSTECH) ;
  • Baek, Rock-Hyun (Department of Electrical Engineering, POSTECH) ;
  • Shin, Hyun-jin (Department of Veterinary Medicine, Chungnam National University) ;
  • Lee, Jeong-soo (Department of Electrical Engineering, POSTECH)
  • 투고 : 2018.08.16
  • 심사 : 2018.09.16
  • 발행 : 2018.09.30
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초록

We have developed a nonlithographic patterning technique using polystyrene nanoparticles to form nanonet channel structures which is promising for high-performance TFT applications. Nanoparticles assisted patterning (NAP) is a technique to form uniform nano-patterns by applying lift-off and dry etch process. Oxygen plasma treatment was used to control the diameters of nanonet hole size to realize a branch width down to 100 nm. NAP technology can be very promising to fabricate nanonet structure with advantages of lower manufacturing cost and large-area patterning capability.

키워드

참고문헌

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