Journal of the Semiconductor & Display Technology (반도체디스플레이기술학회지)

The Korean Society Of Semiconductor & Display Technology (한국반도체디스플레이기술학회)
권호 표지

Computational Fluid Dynamics for Enhanced Uniformity of Mist-CVD Ga2O3 Thin Film

Ga2O3초음파분무화학기상증착 공정에서 유동해석을 이용한 균일도 향상 연구

  • Ha, Joohwan (Research Center for Materials, Components and Equipment, Gyeonggi Province, Advanced Institute of Convergence Technology, Seoul National University) ;
  • Lee, Hakji (Research Center for Materials, Components and Equipment, Gyeonggi Province, Advanced Institute of Convergence Technology, Seoul National University) ;
  • Park, Sodam (Research Center for Materials, Components and Equipment, Gyeonggi Province, Advanced Institute of Convergence Technology, Seoul National University) ;
  • Shin, Seokyoon (Advanced Electronic Materials Laboratory, Advanced Institute of Convergence Technology, Seoul National University) ;
  • Byun, Changwoo (Research Center for Materials, Components and Equipment, Gyeonggi Province, Advanced Institute of Convergence Technology, Seoul National University)
  • 하주환 (서울대학교 차세대융합기술연구원 경기도소재부품장비연구사업단) ;
  • 이학지 (서울대학교 차세대융합기술연구원 경기도소재부품장비연구사업단) ;
  • 박소담 (서울대학교 차세대융합기술연구원 경기도소재부품장비연구사업단) ;
  • 신석윤 (서울대학교 차세대융합기술연구원 차세대전자재료연구실) ;
  • 변창우 (서울대학교 차세대융합기술연구원 경기도소재부품장비연구사업단)
  • Received : 2022.11.23
  • Accepted : 2022.12.13
  • Published : 2022.12.31
Download PDF
⟨ Previous Next ⟩

Abstract

Mist-CVD is known to have advantages of low cost and high productivity method since the precursor solution is misting with an ultrasonic generator and reacted on the substrate under vacuum-free conditions of atmospheric pressure. However, since the deposition distribution is not uniform, various efforts have been made to derive optimal conditions by changing the angle of the substrate and the position of the outlet to improve the result of the preceding study. Therefore, in this study, a deposition distribution uniformity model was derived through the shape and position of the substrate support and the conditions of inlet flow rate using the particle tracking method of computational fluid dynamics (CFD). The results of analysis were compared with the previous studies through experiment. It was confirmed that the rate of deposition area was improved from 38.7% to 100%, and the rate of deposition uniformity was 79.07% which was higher than the predicted result of simulation. Particle tracking method can reduce trial and error in experiments and can be considered as a reliable prediction method.

Keywords

Acknowledgement

이 논문은 2022년도 경기도의 재원으로 (재)차세대융합기술연구원의 지원을 받아 수행된 소재부품장비산업 자립화 연구지원사업임(NO. AICT-018-T3).

References

  1. Oshima, Yuichi, Encarnacion G. Villora, and Kiyoshi Shimamura. "Halide vapor phase epitaxy of twin-free α-Ga2O3 on sapphire (0001) substrates." Applied Physics Express 8.5 (2015): 055501. https://doi.org/10.7567/APEX.8.055501
  2. Akaiwa, Kazuaki, Kentaro Kaneko, Kunio Ichino and Shizuo Fujita. "Conductivity control of Sn-doped α-Ga2O3 thin films grown on sapphire substrates." Japanese Journal of Applied Physics 55.12 (2016): 1202BA. https://doi.org/10.7567/JJAP.55.1202BA
  3. Gim, Jin Gi, Kim, Jongsu and Kim, Gwangchu. "Optical Properties of Ga2O3 Single Crystal by Floating Zone Method." Journal of the Semiconductor & Display Technology, Vol. 20, No. 4. (2021): 78-82.
  4. Lee, Hee Jae, Kim, Min-Yeong, Moon, Soo-Young, Byun, Dong-Wook, Jung, Seung-Woo and Koo, SangMo. "Effect of Annealing on Ga2O3/Al2O3/SiC Devices Fabricated by RF Sputtering," Journal of the Semiconductor & Display Technology, Vol. 21, No. 2. (2022): 85-89.
  5. Ha, Minh Tan, Minh-Tan Ha, Kyoung-Ho Kim, Yun-Ji Shin, Seong-Min Jeong and Si-Young Bae. "Leidenfrost Motion of Water Microdroplets on Surface Substrate: Epitaxy of Gallium Oxide via Mist Chemical Vapor Deposition." Advanced Materials Interfaces, Vol 8, No. 6. (2021): 2001895. https://doi.org/10.1002/admi.202001895
  6. Kyoung-Ho Kim, Minh-Tan Ha, Yong-Jin Kwon, Heesoo Lee, Seong-Min Jeong and Si-Young Bae. "Growth of 2-inch α-Ga2O3 epilayers via rear-flow-controlled mist chemical vapor deposition." ECS Journal of Solid State Science and Technology 8.7 (2019): Q3165-Q3170. https://doi.org/10.1149/2.0301907jss
  7. Ha, Minh Tan, -Ho Kim, Yong-Jin Kwon, Cheol-Jin Kim, Seong-Min Jeong and Si-Young Bae. "Understanding Thickness Uniformity of Ga2O3 Thin Films Grown by Mist Chemical Vapor Deposition." ECS Journal of Solid State Science and Technology 8.7 (2019): Q3106-Q3212.
  8. Joohwan Ha, Sodam Park, Hakji Lee, Seokyoon Shin and Changwoo Byun. "Uniformity Prediction of Mist-CVD Ga2O3 Thin Film using Particle Tracking Methodology." Journal of the Semiconductor & Display Technology, Vol. 21, No. 3, pp. 101-104, 2022.