Journal of the Semiconductor & Display Technology (반도체디스플레이기술학회지)

The Korean Society Of Semiconductor & Display Technology (한국반도체디스플레이기술학회)
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Uniformity Prediction of Mist-CVD Ga2O3 Thin Film using Particle Tracking Methodology

입자추적 유동해석을 이용한 초음파분무화학기상증착 균일도 예측 연구

  • Ha, Joohwan (Research Center for Materials, Components and Equipment, Gyeonggi Province, Advanced Institute of Convergence Technology, Seoul National University) ;
  • Park, Sodam (Research Center for Materials, Components and Equipment, Gyeonggi Province, Advanced Institute of Convergence Technology, Seoul National University) ;
  • Lee, Hakji (Research Center for Materials, Components and Equipment, Gyeonggi Province, Advanced Institute of Convergence Technology, Seoul National University) ;
  • Shin, Seokyoon (Advanced Electronic Materials Laboratory, Advanced Institute of Convergence Technology, Seoul National University) ;
  • Byun, Changwoo (Research Center for Materials, Components and Equipment, Gyeonggi Province, Advanced Institute of Convergence Technology, Seoul National University)
  • 하주환 (서울대학교 차세대융합기술연구원 경기도소재부품장비연구사업단) ;
  • 박소담 (서울대학교 차세대융합기술연구원 경기도소재부품장비연구사업단) ;
  • 이학지 (서울대학교 차세대융합기술연구원 경기도소재부품장비연구사업단) ;
  • 신석윤 (서울대학교 차세대융합기술연구원 차세대전자재료연구실) ;
  • 변창우 (서울대학교 차세대융합기술연구원 경기도소재부품장비연구사업단)
  • Received : 2022.09.08
  • Accepted : 2022.09.20
  • Published : 2022.09.30
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Abstract

Mist-CVD is known to have advantages of low cost and high productivity compared to ALD and PECVD methods. It is capable of reacting to the substrate by misting an aqueous solution using ultrasonic waves under vacuum-free conditions of atmospheric pressure. In particular, Ga2O3 is regarded as advanced power semiconductor material because of its high quality of transmittance, and excellent electrical conductivity through N-type doping. In this study, Computational Fluid Dynamics were used to predict the uniformity of the thin film on a large-area substrate. And also the deposition pattern and uniformity were analyzed using the flow velocity and particle tracking method. The uniformity was confirmed by quantifying the deposition cross section with an FIB-SEM, and the consistency of the uniformity prediction was secured through the analysis of the CFD distribution. With the analysis and experimental results, the match rate of deposition area was 80.14% and the match rate of deposition thickness was 55.32%. As the experimental and analysis results were consistent, it was confirmed that it is possible to predict the deposition thickness uniformity of Mist-CVD.

Keywords

Acknowledgement

이 논문은 2022년도 경기도의 재원으로 (재)차세대융합기술연구원의 지원을 받아 수행된 소재부품장비산업 자립화 연구지원사업임(NO. AICT-018-T3).

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