• Journal of the Korean Society for Precision Engineering
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• v.28 no.3
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• pp.383-388
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• 2011

The cold hollow cathode gas ion source is under development for multi aperture focused ion beam (FIB) system. In this paper, we describe the cold hollow cathode ion source design and the general ion source performance using Ar gas. The glow discharge characteristics and the ion beam current density at various operation conditions are investigated. This ion source can generate maximum ion beam current density of approximately 120 mA/$cm^2$ at ion beam potential of 10 kV. In order to effectively transport the energetic ions generated from the ion source to the multi-aperture focused ion beam(FIB) system, the einzel lens system for ion beam focusing is designed and evaluated. The ions ejected from the ion source can be forced to move near parallel to the beam axis by adjusting the potentials of the einzel lenses.

• Applied Science and Convergence Technology
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• v.25 no.6
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• pp.116-119
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• 2016

In this study, we fabricated the $K^+$ ion source for the various purposes and investigated the emission characteristics. The fabricated $K^+$ ion source was painted in the tungsten filament to make filament type ion source. The RGA spectra show that the filament type $K^+$ ion source has a good out gassing character, so it can be used in the ultra-high vacuum system. The maximum $K^+$ ion current was 20 mA when filament temperature was 1410 K and filament potential was 50 V. When the filament temperature was 1070 K, the initial beam current was 50 mA and decreased only by 2% during 4 hours. The emitting energy was measured to be 2.04 eV. This low value means that the fabricated specimen is a good $K^+$ ion source. We conclude that this filament type ion source can be used in various fields, including the LEIS research.

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2011.06a
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• pp.785-786
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• 2011

• Applied Science and Convergence Technology
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• v.27 no.4
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• pp.65-69
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• 2018

We studied the critical pressure characteristics of an anode type ion beam source driven by both charge repulsion and diffusion mechanism. The critical pressure $P_{crit}$ of the diffusion type ion beam source was linearly decreased from 2.5 mTorr to 0.5 mTorr when the gas injection was varied in 3~10 sccm, while the $P_{crit}$ of the charge repulsion ion beam source was remained at 3.5 mTorr. At the gas injection of 10 sccm, the range of having normal beam shape in the charge repulsion ion beam source was about 6.4 times wider than that in the diffusion type ion beam source. An impurity of Fe 2p (KE = 776.68 eV) of 12.88 at. % was observed from the glass surface treated with the abnormal beam of the charge repulsion type ion beam source. The body temperature of the diffusion type ion beam source was observed to increase rapidly at the rate of $1.9^{\circ}C/min$ for 30 minutes and to vary slowly at the rate of $0.1^{\circ}C/min$ for 200 minutes for an abnormal beam and normal beam, respectively.

• Nuclear Engineering and Technology
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• v.29 no.3
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• pp.181-185
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• 1997

The ion sources for induction linac driven heavy ion fusion were fabricated and their omittance characteristics were investigated. For to kinds of ion sources, i. e. a carbon vacuum arc ion source and a cusp field rf ion source, the emittance was measured with a double slit beam scanner. The required normalized omittance of an ion source for heavy ion fusion is 10$^{-7}$ - 5$\times$10$^{-7}$ $\pi$ m-rod, and the measured emittances of the ion beams from carbon vacuum arc ion source and cusp field rf ion source (Ne$^{+}$) were 2$\times$10$^{-6}$ $\pi$ m-rad and 4$\times$10$^{-7}$ $\pi$ m-rad, respectively.y.

• Proceedings of the Korean Society of Machine Tool Engineers Conference
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• 2004.04a
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• pp.494-499
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• 2004

A ion source using inductively coupled plasma has been tested in order to test its feasibility as a high brightness ion source for focused ion beam. When operating the ion source with filter magentas in front of plasma electrode for a negative ion source, lower remittances are expected. Extracted beam remittances are measured with an Allison-type scanning device for various plasma parameters and extraction conditions. The normalized omittance has been measured to be around 0.2$\pi$mmmrad with beam currents of up to 0.55 ㎃. In particular, noting that multicusp magnets have a role in decreasing the remittance as well as increasing plasma discharge efficiency, transverse magnetic field has been confirmed to be a useful tool fur decreasing remittance via electron energy control.

• Journal of Korean Vacuum Science & Technology
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• v.7 no.2
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• pp.45-56
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• 2003

A high flux metal plasma pulse ion source, which can simultaneously perform ion implantation and deposition, was developed and tested to evaluate its performance using the prototype. Flux of ion source was measured to be 5 A and bi-polar pulse power supply with a peak voltage of 250 V, repetition of 20 Hz and width of 100 ${\mu}\textrm{s}$ has an output current of 2 kA and average power of 2 kW. Trigger power supply is a high voltage pulse generator producing a peak voltage of 12 kV, peak current of 50 A and repetition rate of 20 Hz. The acceleration column for providing target energy up to ion implantation is carefully designed and compatible with UHV (ultra high vacuum) application. Prototype systems including various ion sources are fabricated for the performance test in the vacuum and evaluated to be more competitive than the existing equipments through repeated deposition experiments.

• Nuclear Engineering and Technology
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• v.56 no.1
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• pp.70-77
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• 2024

A low energy ion irradiation system based on the deuterium arc ion source with a high perveance of 1 µP for a single extraction aperture has been successfully developed for the investigation of ion irradiation on plasma-facing components including the first mirror of plasma optical diagnostics system. Under the optimum operating condition for mirror testing, the ion source has a beam energy of 200 eV and a current density of 3.7 mA/cm². The ion source comprises a magnetic cusp-type plasma source, an extraction system, a target system with a Faraday cup, and a power supply control system to ensure stable long time operation. Operation parameters of plasma source such as pressure, filament current, and arc power with D₂ discharge gas were optimized for beam extraction by measuring plasma parameters with a Langmuir probe. The diode electrode extraction system was designed by IGUN simulation to optimize for 1 µP perveance. It was successfully demonstrated that the ion beam current of ~4 mA can be extracted through the 10 mm aperture from the developed ion source. The target system with the Faraday cup is also developed to measure the beam current. With the assistance of the power control system, ion beams are extracted while maintaining a consistent arc power for more than 10 min of continuous operation.

• Progress in Superconductivity and Cryogenics
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• v.18 no.2
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• pp.25-29
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• 2016

High charge state electron cyclotron resonance (ECR) ion source is important on the performance of heavy ion accelerators. In this paper, a low temperature superconductor (LTS) was used to make a hexapole coil for an 18-GHz ECR ion source. Several hexapole structures, including racetrack, graded racetrack, and saddle were implemented and analyzed for the hexapole-in-solenoid ECR ion source system. Under the appropriate radial confinement field, the smaller outer radius of hexapole can be better for the solenoid design. Saddle hexapole was selected by comparing the wire length, maximum outer radius of the hexapole, the Lorentz force at the end part of the hexapole and the maximum magnetic field in the coil. Based on saddle hexapole, a new design for hexapoles, the snake hexapole, was developed in this paper. By comparative analysis of the Lorentz force at the end part of the saddle and snake hexapoles, the snake hexapole is much better in the ECR ion source system. The suggested design for the ECR ion source with the snake hexapole is presented in this paper.

• Proceedings of the Korean Vacuum Society Conference
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• 1999.07a
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• pp.73-73
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• 1999

A large area negative metal ion beam source is developed. Kinetic ion beam of the incident metal ions yields a whole nucleation and growth phenomena compared to the conventional thin film deposition processes. At the initial deposition step one can engineer the surface and interface by tuning the energy of the incident metal ion beams. Smoothness and shallow implantation can be tailored according to the desired application process. Surface chemistry and nucleation process is also controlled by the energy of the direct metal ion beams. Each individual metal ion beams with specific energy undergoes super-thermodynamic reactions and nucleation. degree of formation of tetrahedral Sp3 carbon films and beta-carbon nitride directly depends on the energy of the ion beams. Grain size and formation of polycrystalline Si, at temperatures lower than 500deg. C is obtained and controlled by the energy of the incident Si-ion beams. The large area metal ion source combines the advantages of those magnetron sputter and SKIONs prior cesium activated metal ion source. The ion beam source produces uniform amorphous diamond films over 6 diameter. The films are now investigated for applications such as field emission display emitter materials, protective coatings for computer hard disk and head, and other protective optical coatings. The performance of the ion beam source and recent applications will be presented.