Formation of Silicon nanocrystallites by ion beam assisted electron beam deposition

  • Won Chel Choi (Semiconductor Materials Laboratory Korea Institute of Science and Technology pp.O.Box 131 Cheongryang)
  • Published : 1998.02.01

Abstract

Nano-crystalline silicon(nc-Si) thin films were directly depposited by ion beam assisted electron beam depposition (IBAED) method. The visibe luminescence in IBAED sampples were originated from not an oxygen bond but Si nano-crystallites. And we can conclude that the ion beam would be contribute to the suppression of the Si-O bond formation.

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