반도체디스플레이기술학회지 (Journal of the Semiconductor & Display Technology)
- 제2권3호
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- Pages.19-23
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- 2003
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- 1738-2270(pISSN)
Role of Magnetic Field Configuration in a Performance of Extended Magnetron Sputtering System with a Cylindrical Cathode
- Chun, Hui-Gon (School of Materials Science and Engineering, ReMM, University of Ulsan) ;
- Sochugov, Nikolay S. (Institute of High Current Electronics, Siberian Division of Russian Academy of Science) ;
- You, Yong-Zoo (School of Materials Science and Engineering, ReMM, University of Ulsan) ;
- Soloviv, Andrew A. (Institute of High Current Electronics, Siberian Division of Russian Academy of Science) ;
- Zakharov, Alexander N, (Institute of High Current Electronics, Siberian Division of Russian Academy of Science)
- 발행 : 2003.09.01
초록
Extended unbalanced magnetron sputtering system based on the cylindrical magnetron with a rotating cathode was developed. The unbalanced configuration of magnetic field was realized by means of additional lines of permanent magnets, placed along both sides of a 89 mm outer diameter and 600 mm long cylindrical cathode. The performance of the unbalanced magnetron was assessed in terms of the ion current density and the ion-to-atom ratio incident at the substrate. Furthermore, the paper presents the comparison of the internal plasma parameters, such as the electron temperature, electron density, plasma and floating potentials, measured by a Langmuir probe in various positions from the cathode, for conventional and unbalanced constructions of the cylindrical magnetron. The plasma density and ion current density are about 3-5 times higher than those of conventional one, in the unbalanced magnetron in a 0.24 Pa Ar atmosphere with a DC cathode power of 3 kW.